ADD APT PolySurF HPSi Mixture of acrylated mono-and di-phosphate ester ADD APT Flow / Levelling agent >> Polyacrylate Photoinitiator Slip control Wetting agent/ Wet edge enhancer >> Surfactant Acrylic/Acrylate Resins Polyester Vinyl Coatings >> UV / Radiation Curing Coatings >> Waterborne ADD APT PolySurF HPSi is a solvent-free UV-curable release and slip additive. It can also act as a co-polymerisable silicone surfactant. It is a proprietary mixture of Acrylated mono-and di-Phosphate ester; the mono-Phosphate being O-Polyether -(CH2)m-SiCH3{O-Si(CH3)2-O-Si(CH3)3}2 modified; where the reactive Acrylate group is Methacrylate) Emulsions for paints, lacquers, printing inks and adhesives As surfactant: 0.5 - 2.5 % wt. based on monomers Polymerisable release and slip additive for polyacrylates, polyesters, PVC Polymerisable wetting and levelling agent for coatings Easy to handle liquid. It shows an extreme and immediate release effect in UV-curing systems It also improves the slip and scratch resistance of the formulation. It has an additional de-aeration effect. No migration occurs after curing. When used as a surfactant, it improves both the storage and mechanical stability of an emulsion system, whereas foam formation is minimised. No migration of the Silicone Surfactant occurs after film formation This “build-in” Silicone Surfactant shows in water-based systems a tendency to greatly lower the surface tension and improved slip properties. The di-phosphate ester affords some degree of cross-linking without gel formation. Mixture of methacrylated mono-and di-phosphate ester. Used as a solvent free UV-curable release and slip additive for paints, lacquers and printing inks and as a polymerisable wetting and levelling agent for coatings. Can be used as a co-polymerisable silicone surfactant. Offers easy handling and very good and immediate release effect. Improves slip and scratch resistance and storage and mechanical stability. Offers de-aeration effect and no migration. Reduces foam formation. Lowers surface tension in water-based systems. Gives some degree of cross-linking without gel formation. Use level: 0.5-2.5 %wt based on monomers.